Product Description
Mercury Electronic Silicon Carbide Precision Polishing Liquid aims to help customers improve substrate quality, reduce costs, and increase efficiency.
This product uses imported high-purity silica sol as the main raw material, with uniform distribution of silica particle size and good dispersibility. Combining a specially formulated formula to improve the surface quality of wafer substrates. Easy to use and easy to clean.
Product and Performance
■ Special chemically active nano abrasives
■ High removal rate, 1.5-6 microns/hour
■ High surface quality, surface roughness RMS<1 Å
■ (on a 5 x 5) μ M ² AFM scan
Model
|
Appearance
|
Medium particle size nm
|
pH
|
Proportion wt/%
|
MATL-401
|
Purple
|
60-90nm
|
2-4
|
2
|
MATL-402
|
Purple
|
70-100nm
|
2-4
|
2
|
Recommended Applications
■ Single crystal silicon carbide wafer/substrate, carbon/silicon surface
■ Polycrystalline and ceramic silicon carbide